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SCHOTT HermeS® Substrate


The SCHOTT HermeS® wafer specially designed for use in Micro-Electro Mechanical Systems (MEMS), offers superior hermeticity and enhanced electrical properties. As fine-pitched vias can be placed directly under the silicon MEMS device, it is an excellent aid to integrated, miniaturized MEMS designs.

Product Description
Packaging MEMS devices is often as demanding, if not more, than a microelectronic package. Requirements such as miniaturization, hermeticity, and performance in challenging environments are just some of the basic needs for a MEMS package.

SCHOTT HermeS®, a glass substrate with hermetically sealed solid metal vias, is an ideal solution for MEMS. Applying our accumulated experience with glass-to-metal sealing technology, HermeS® provides superior hermeticity, enhanced electrical properties and thermal reliability. It is also compatible with state-of-the-art wafer-scale bonding assembly processes (e.g. anodic, glass frit and solder).

Product Advantages
The HermeS® substrate offers the following advantages
  • Miniaturization / reduction in die size / compact design
  • Superior reliability and hermeticity
  • Wafer-level packaging solution that is compatible with processes such as glass frit, solder and anodic bonding
  • Compatible with SMT using BGA or LGA
  • CTE matched to silicon
  • Direct through wafer electrical connection leads to a compact, simplified and flexible packaging design
  • High performance electrical and thermal path to the printed circuit board
    • Application-specific advantages, e.g.
      • RF: superior electrical properties
      • Optical applications: transparency


    Applications
    HermeS® can be used for a wide variety of MEMS applications such as:
    • Sensors (e. g. gyroscope, accelerometers, pressure-, position-, flow-,
    • vibration-, RF-, ...)
    • RF (e.g. switches, oscillators, filters)
    • Optical MEMS (e. g. optical mirrors, micro-optical benches, optical switches, micro-spectrometers)
    • Micro fluids (e.g. inkjet heads, microprobes, actuators, valves, pumps
    • Si Microphones






    Close up of hermetically sealed metal vias in glass substrate
    Technology
    SCHOTT HermeS® uses glass-to-metal sealing (GTMS) technology to provide superior hermeticity in a wafer-scale packaging solution. Please contact us for more information.

    Features/ Specifications

    Wafer size: 4", 6", 8"
    Wafer thickness: 500 ± 20 μm (0.0197” ± 0.00079”)
    (Min. 350 μm [0.0138”])
    Contact via pitch: 250μm (0.0098”), 200μm (0.0079”), 150μm (0.0059”)*
    Contact via diameter: 100μm (0.0039”), 80μm (0.0032”), 50μm (0.0020”)*
    Glass: SCHOTT BOROFLOAT® 33 (low alkaline glass)
    Pin: Tungsten (W)
    Hermeticity: ≤ 1 × 10–9 Pa · m3/sec

    [≤ 1 × 10–8mbar/sec]

    [≤ 1 × 10–8atm cc/sec]
    Electric resistance of W: 5.5μΩcm
    CTE of B33: 3.25x10-6/K
    Dielectric constant of B33: 4.6
    Index Refraction of B33: 1.47 at 600nm
    (* : Under development)


    New Line-up!
    Glass material: D263TMTeco AF32TMTeco
    Glass CTE: 7.2 x 10-6/K 3.2 x 10-6/K
    Via material: FeNi (50%) Tungsten (W)


    Forms of Supply and Product Packaging

    Please contact us for a detailed discussion about your requirements.

    Quality Assurance

    For more information, please refer to our quality assurance processes .

    Download

    SCHOTT HermeS® Product Flyer
    业务联系

    NEC SCHOTT
    Components Corporation

    3-1 Nichiden
    Minakuchi-cho,Koka-shi,
    528-0034 Shiga
    Japan
     +81-748-63-6610
     +81-748-63-5134
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